(adsbygoogle = window.adsbygoogle || []).push({}); Atomic layer deposition (ALD) technology is a self-limiting ultrathin film deposition method. In ALD reactions, the reaction temperature plays a key role. And generalized predictive control (GPC) algorithm is adopted to control the temperatur...
日期:2014-09-03 浏览:1477次 阅读全文
(adsbygoogle = window.adsbygoogle || []).push({}); Probe-based memory devices using ferroelectric media have the potential to achieve ultrahigh data-storage densities under high write-read speeds. However, the high-speed scanning operations over a device lifetime of 5-10 years, which correspo...
日期:2014-09-03 浏览:1505次 阅读全文
(adsbygoogle = window.adsbygoogle || []).push({}); 1.原子层沉积工艺         原子层沉积技术(atomic layer deposition, ALD)已经逐渐成为了一项沉积功能薄膜的重要技术。该技术可以在纳米级尺度上精确控制物质成分和形貌,它可以将被沉积物质以单原子膜的形式一层一层的镀在基底表面。原子层沉积的过程是通过...
日期:2014-09-03 浏览:3365次 阅读全文
前排(从左至右):文艳伟[老师],冯子健,刘潇,曹坤,段献宝,马波,朱倩倩,杨文娟,周雪琪,蒋华伟,周涛,高玉乐,邓章,褚波 后排(从左至右):单斌[老师],施露,董得超,汪洋,吴蔚然,王远伟,张怡航,田戡,周兵,段晨龙,彭琪,何文杰,杨家强,黄彬,陈蓉[老师]
日期:2013-12-31 浏览:3050次 阅读全文